3" Rinse Handle

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Handle for 3" wafers for easy rinsing and careful puddle processing. Puddle processing is possible if the liquid is carefully poured onto the wafer, taking care not to break the su rface tension. We generally use the Rinse Handle for etch solutions, and Soak Handle for development. Works best with denser substrates such as GaAs. Silicon tends to float and is less ideal. Show more