Target USAF 1951 High Res Fused Silica (NEG) The USAF 1951 target pattern is a versatile aid for the determination of resolution and contrast in optical systems. The target pattern is defined by MIL-S-150A and contains blocks of 3 equally spaced bars set at right angles to each other. The frequency of each element varies according to the included chart. The large range of frequencies helps to pinpoint the resolution at which the system loses contrast or MTF.This high resolution version of the standard USAF 1951 resolution target covers Group 0 Element 1 (1.00 LP/MM) to Group 9 Element 3 (645.08 LP/MM). The pattern is formed in durable double layer reflective chromium on a stable 1.5mm thick fused silica (Quartz) substrate. Negative Version: Clear features on an opaque field Overall dimensions are 2” x 2” User card is included to convert Group/Element numbers to Line Width and Frequency Plastic carrying case is included to protect the target For complete specifications on this target, please see the drawing listed under Technical Specifications below. Click here to download drawing
