Electro CLNR-PRO 300 Electro CLNR-PRO 300 is an ammonia-based low foaming alkaline concentrate detergent with pH 9-11. It is a technologically advanced cleaning chemistry designed to meet the challenges of semiconductor/wafer uneven surfaces in critical cleaning in FEOL and BEOL steps. It does not contain chlorine or acids, to be diluted 1:30 with DI-Water. Key features: It is chemically infused with electrostatic charges on the surface and the liquid particles. Electrostatic repulsion forces remove particles without additional mechanical force produced by mega-sonics or under-cut etching from elevated bath chemistries. It works best with intricate surface patterns. The uneven surfaces present an increased degree of difficulty due to surface damage from high power mega-sonics and undercut etching combined with elevated chemistry temperatures. Performs at ambient room temperatures in static or filtered recirculated baths. Performs excellent at elevated temperatures and ultrasonic cycles. It is a great substitute for NH4OH in an SC-1 or APM process chemistry. It is made on the basis of TMAH. (Tetramethylammonium hydroxide (TMAH) is widely used in micro- or nanofabrication as an etchant or developer). Our solution improves on results of SC-1(Standard Clean 1) or APM (Ammonia Peroxide Mixture) methods as it does not require heated temps or high power megasonic methods. It can be used to clean Ti, TiN and W surfaces. Request a free sample and consultation for your needs. Technical Specifications: Download MSDS Sheet for Electro CLNR-PRO 300 (PDF)
