Michael Nastasi, James Mayer, James K. HirvonenCambridge University Press, 4/4/1996EAN 9780521373760, ISBN10: 052137376XHardcover, 572 pages, 22.8 x 15.2 x 3.7 cmLanguage: EnglishModern technology depends on materials with precisely controlled properties. Ion beams are a favoured method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition to integrated circuit technology, ion beams are used to modify the mechanical, tribological and chemical properties of metal, intermetallic and ceramic materials without altering their bulk properties. Ion–solid interactions are the foundation that underlies the broad application of ion beams to the modification of materials. This text is designed to cover the fundamentals and applications of ion–solid interactions and is aimed at graduate students and researchers interested in electronic devices, surface engineering, reactor and nuclear engineering and material science issues associated with metastable phase synthesis.1. General features and fundamental concepts2. Interatomic potentials3. Dynamics of binary elastic collisions4. Cross-section5. Ion stopping6. Ion range and range distribution7. Radiation damage and spikes8. Ion–solid simulations and irradiation enhanced transport9. Sputtering10. Order-disorder under irradiation and ion implantation metallurgy11. Ion beam mixing12. Phase transformations13. Ion beam assisted deposition14. Applications of ion beam processing techniques15. Ion beam system featuresAppendicesA. CrystallographyB. Table of contentsC. Density of statesD. Derivation of the Thomas–Fermi differential equationsE. Centre-of-mass and laboratory scattering anglesF. Miedema's semi-empirical model for the enthalpy of formation in the liquid and solid stateG. Implantation metallurgy – study of equilibrium alloys.
