Nikon CF Plan 100X BD ELWD DIC Reflected Light Objective🔬 100X Plan objective with BD + DIC — brightfield, darkfield, and differential interference contrast in a single objective📏 2mm extra-long working distance — exceptional clearance at 100X for large or mounted specimens🎯 0.80 NA — high resolution for reflected light surface imaging without immersion🔩 M25 thread, infinity corrected — compatible with Nikon reflected light industrial microscopes🌗 Brightfield & darkfield in one — switch between surface illumination modes without changing objectives✅ Condition: Flawless optics, some exterior lettering wear — optically perfect, cosmetically used🎓 University purchase orders accepted🔧 Product DescriptionThe Nikon CF Plan 100X BD ELWD DIC (MUM23901) is a premium reflected light objective combining brightfield (BD), darkfield, and differential interference contrast (DIC) capabilities in a single unit — eliminating the need to swap objectives when switching between surface imaging modes. The extra-long working distance (ELWD) of 2mm is exceptional for a 100X objective, providing generous clearance for large, mounted, or irregularly shaped specimens that would be impractical with standard working distance objectives. At 0.80 NA, it delivers high-resolution surface imaging without immersion media, making it ideal for non-contact inspection of semiconductor wafers, metals, ceramics, and other industrial materials. The M25 thread and infinity corrected design ensure compatibility with Nikon’s reflected light industrial microscope systems. Optics are in flawless condition; exterior shows some lettering wear consistent with prior use — optical performance is uncompromised. Manufactured in Japan to Nikon’s exacting standards.🔎 Typical Applications Semiconductor wafer and IC inspection at 100X Metallographic surface analysis — grain structure, coatings, and defects Ceramics, composites, and advanced materials surface examination Darkfield detection of surface scratches, pits, and contamination DIC imaging of surface topography and thin film structures 📊 Key Specifications Specification Details Part Number MUM23901 Magnification 100X Numerical Aperture 0.80 Working Distance 2mm (ELWD) Thread M25 Optical System Infinity Corrected Techniques Brightfield, Darkfield (BD), DIC Immersion Dry Compatible With Nikon Reflected Light Microscopes Condition Flawless Optics, Some Exterior Lettering Wear Country of Origin Japan Spach Optics proudly accepts university purchase orders. Contact us with any questions — we’re happy to help.
