High-performance 40× ELWD objective with broad spectral transmission and long working distance. 🔬 40× Magnification, NA 0.60 — Excellent resolution and contrast for demanding imaging tasks. 📏 Extra-Long Working Distance (~3.0–3.5 mm) — Space for thicker samples, cover glass, and tools. 🧠 Plan Fluor Optical Design — Flat field and minimized aberrations across the imaging field. 🌈 Broad Spectral Transmission — Designed for UV through near-IR imaging applications. ⚙️ Air (Dry) Objective — No Immersion Required — Suited for brightfield, fluorescence, and DIC imaging. 🧪 Product Description (Long-Form) The Nikon S Plan Fluor ELWD 40× Objective is a precision microscope objective engineered for high-resolution imaging with extended working distance — ideal for samples that require extra clearance, such as thick slides, culture dishes, or mounted specimens. With 40× magnification and a numerical aperture (NA) of 0.60, this objective delivers crisp images with excellent contrast and resolution, making it suitable for a wide range of microscopy techniques including brightfield, fluorescence, DIC, and phase contrast. Extra-long working distance (ELWD) optics like this one provide an extended focal space of approximately 3.0–3.5 mm, enabling imaging of thicker specimens and easier access for manipulators, probes, or perfusion systems — a valuable advantage for research, clinical, and industrial microscopy workflows. The Plan Fluor optical design combines flat-field correction with reduced chromatic and spherical aberrations to ensure sharp, uniform images from center to edge. With broad spectral transmission spanning the near-ultraviolet through the visible and into near-infrared, this objective supports multimodal imaging across diverse applications. This objective uses a standard M25 threaded mount and is designed for infinity-corrected microscope systems, making it compatible with many upright microscopes common in life science, clinical, and material science laboratories. 🔎 Typical Applications Brightfield microscopy Fluorescence imaging Differential interference contrast (DIC) Phase contrast microscopy Imaging through thick specimens and culture hardware 📊 Key Specifications Specification Details Magnification 40× Numerical Aperture (NA) 0.60 Optical Design Plan Fluor ELWD Working Distance ~3.0–3.5 mm Field Number 22 mm Sensor Format Up to 2/3″ Cover Glass Thickness 0–2 mm Mount M25 × 0.75 Thread Immersion Medium Air (dry) Parfocal Length ~60.41 mm Condition New / Open Box
