The Nikon L Plan EPI 2.5x Reflected Light Objective (cat. no. MUE00031) is a low-magnification, wide-field overview objective designed for reflected-light (EPI) microscopy on Nikon infinity-corrected systems. With a 2.5x magnification, N.A. 0.075, and 8.8mm working distance, it delivers a broad field of view ideal for specimen orientation, large-area survey imaging, and macro-level surface inspection before stepping up to higher magnifications. This unit is in excellent, as-new condition, available at significant savings over new pricing. 🔬 2.5x magnification — wide-field overview for large specimens and macro-level surface survey 📏 8.8mm working distance with N.A. 0.075 for comfortable low-magnification imaging 💡 EPI (reflected light) design for opaque and surface-level specimen inspection 🔩 M25 thread, infinity-corrected — compatible with all Nikon infinity-corrected microscopes 🔧 BD nosepiece compatible — adapter available (contact us) for use on Nikon BD nosepieces ✅ Light Use, Flawless Optics, inspected and verified 🔧 Product Description The Nikon L Plan EPI 2.5x (cat. no. MUE00031) is the standard low-magnification entry point in Nikon's L Plan EPI reflected-light objective series, designed for use on Nikon infinity-corrected upright and industrial microscopes. At 2.5x, it provides the widest field of view in the series — essential for initial specimen orientation, locating regions of interest across large surfaces, and macro-level overview imaging before transitioning to higher magnification objectives. The L Plan optical correction delivers a flat, well-corrected field suited to both visual inspection and camera-based documentation. With an M25 thread and infinity-corrected design, it fits directly into Nikon's standard nosepieces; for use on Nikon BD (Brightfield/Darkfield) nosepieces, a thread adapter is available — please contact us. This listing is for a unit in excellent, as-new condition — an exceptional value at well below new cost. 🔎 Typical Applications Large-area surface survey and specimen orientation at low magnification Semiconductor wafer and panel macro-level inspection PCB and large component overview imaging Locating regions of interest before switching to higher magnification objectives Metallurgical and materials surface overview Industrial quality control on large or complex parts 📊 Key Specifications Specification Details Manufacturer Nikon Model / Part Number L Plan EPI 2.5x / MUE00031 Magnification 2.5x Numerical Aperture (N.A.) 0.075 Working Distance (W.D.) 8.8mm Thread M25 Optical System Infinity-Corrected Illumination Type EPI (Reflected Light) Optical Correction L Plan BD Nosepiece Compatibility Yes — adapter available (contact us) Immersion Medium Dry (Air) Condition Excellent — As New Country of Origin Japan University and institutional customers are welcome to submit a purchase order. Please contact us for net terms and academic pricing.
