The Olympus LMPlanApo 250×/0.90 Brightfield & Darkfield Long Working Distance Objective is the highest magnification objective Olympus produces for reflected light microscopy — delivering 250× magnification with dual brightfield and darkfield capability, plan apochromat correction, and a 0.8mm working distance for the most demanding high-magnification surface inspection applications in semiconductor, metallographic, and advanced materials microscopy. Offered here new at significant savings versus the list price. 🏆 Highest power Olympus reflected light objective — the LMPlanApo 250× is the highest magnification objective in the Olympus reflected light lineup, providing the ultimate resolving power for sub-micron feature inspection on opaque specimens 🔦 Dual brightfield & darkfield (BD) capability — a single objective supports both brightfield and darkfield reflected light imaging; darkfield delivers high-contrast detection of surface defects, scratches, grain boundaries, and fine topographic features that are invisible or poorly contrasted in brightfield at 250× 🔬 NA 0.90 at 250× — high numerical aperture for maximum resolution at this magnification, enabling visualization of the finest microstructural details and sub-micron surface features 📏 Long working distance: 0.8mm — generous clearance for a 250× objective, providing practical working room for specimen manipulation and stage movement 🌟 Plan apochromat (LMPlanApo) correction — Olympus plan apochromat correction for flat-field imaging with accurate chromatic registration across the full visible spectrum, essential for accurate documentation and color-based analysis at extreme magnification ♾️ Infinity-corrected, M26 thread — compatible with Olympus BX, GX, MX, and BHM series industrial and materials microscopes 🇯🇵 Olympus quality, made in Japan — precision optical construction for consistent, high-efficiency light transmission and long service life ✅ Condition: New — SKU LMPLAPO250XBD 🔧 Product Description The Olympus LMPlanApo 250×/0.90 BD is the pinnacle of Olympus’s reflected light objective lineup — the highest magnification objective the company produces for reflected light microscopy, designed for the most demanding sub-micron surface inspection applications in semiconductor, metallographic, and advanced materials science. At 250× with NA 0.90, this objective delivers the maximum resolving power available in Olympus reflected light microscopy, enabling visualization of features and defects that are beyond the resolution limit of lower-magnification objectives. The BD (Brightfield/Darkfield) design supports both illumination modes from a single objective — brightfield for standard surface imaging and darkfield for high-contrast detection of surface topography, scratches, etchings, grain boundaries, and thin film defects that scatter light differently from the surrounding surface. At 250×, darkfield imaging reveals surface features at a level of detail that is simply not achievable at lower magnifications. The plan apochromat correction ensures flat-field imaging with accurate chromatic registration across the full visible spectrum, essential for reliable color-based defect analysis and documentation at extreme magnification. The 0.8mm working distance is practical for a 250× objective, providing sufficient clearance for specimen manipulation. Compatible with Olympus BX, GX, MX, and BHM series industrial and materials microscopes with M26 thread nosepieces. Supplied new from stock, SKU LMPLAPO250XBD. 🔎 Typical Applications Semiconductor wafer and IC inspection at maximum magnification for sub-micron defect detection Darkfield inspection of surface scratches, etchings, and grain boundaries at 250× High-magnification metallographic examination of fine grain structure and microfeatures Thin film and coating defect analysis requiring maximum resolving power Advanced materials surface inspection at the resolution limit of optical microscopy Any application requiring the highest magnification available in Olympus reflected light microscopy 📊 Key Specifications Specification Details SKU LMPLAPO250XBD Magnification 250× Numerical Aperture (NA) 0.90 Immersion Medium Dry (air, no coverslip) Working Distance 0.8mm (LWD) Illumination / Contrast Brightfield & Darkfield reflected light (BD) Optical Design LMPlanApo BD (Plan Apochromat, LWD, BD) Correction Infinity-corrected Thread / Mount M26 Compatible Microscopes Olympus BX, GX, MX, BHM series industrial/materials microscopes Country of Origin Japan Condition New University and institutional purchase orders are welcome. Please contact us for invoicing and procurement documentation.
