OLYMPUS LPLAN N 40X LONG WORKING DISTANCE OBJECTIVE Achieve high-resolution imaging with exceptional working distance and correction collar versatility, featuring: 📏 Exceptional 3.40-4.10mm working distance for thick specimens and experimental access 🔬 40x magnification with 0.60 numerical aperture for high-resolution imaging ⚙️ Correction collar for optimizing performance across varying coverslip thicknesses (0-1.00mm) 🎯 Long Plan design combining extended working distance with flat-field correction 🔧 RMS thread mount for universal microscope compatibility ✨ Factory-new condition with pristine optical performance 🔧 Product Description The Olympus LPlan N 40x objective is specifically engineered to provide exceptional working distance while maintaining high optical performance and versatility through an integrated correction collar. The "LPlan" designation indicates Long Plan optics, combining extended working distance with flat-field correction for applications requiring both high magnification and exceptional clearance. At 40x magnification with 0.60 numerical aperture, this objective delivers excellent resolution and light-gathering capability for detailed cellular imaging while maintaining a working distance of 3.40-4.10mm—significantly greater than standard 40x objectives. This extended working distance is essential for imaging through thick specimens, culture vessels, microfluidic devices, or when experimental access is required for micromanipulation equipment. The integrated correction collar enables precise compensation for variations in coverslip thickness from 0 to 1.00mm, mounting media refractive index, and specimen preparation variations, ensuring optimal optical performance across diverse applications. This wide correction range makes the objective particularly valuable for imaging specimens without coverslips, thick coverslips, or non-standard preparations. The flat-field correction ensures sharp, distortion-free images across the entire field of view. The RMS thread mount ensures compatibility with a wide range of microscope platforms. Factory-new condition ensures optimal performance and reliability for demanding research and industrial applications requiring both high resolution and exceptional working distance. 🔎 Typical Applications Thick-tissue section imaging and cleared tissue microscopy Imaging through culture vessels and microfluidic devices Micromanipulation with simultaneous high-resolution imaging Non-coverslip preparations and variable specimen thicknesses Materials science and industrial inspection requiring extended clearance Applications requiring both high magnification and experimental access 📊 Key Specifications Specification Details Catalog Number 1-U2B228 Magnification 40x Numerical Aperture (NA) 0.60 Working Distance 3.40-4.10mm Optical Design LPlan N (Long Plan with flat-field correction) Correction Collar Yes (0-1.00mm coverslip compensation) Thread Mount RMS (universal compatibility) Condition Factory-new Primary Advantage Exceptional 3.40-4.10mm working distance with correction collar versatility University purchase orders are welcomed and accepted. Contact us for institutional pricing and procurement assistance.
