Premium 100× semi-apochromatic objective with ultra-high numerical aperture — ideal for maximum magnification imaging and ultra-fine detail observation in industrial microscopy. 🔬 100× Magnification, NA 0.90 — Ultra-high numerical aperture for exceptional resolution at maximum magnification. ✨ Semi-Apochromatic Correction — Superior color correction and image quality across the visible spectrum. 🎯 Plan Fluorite (MPLFLN) Optics — Flat-field imaging from center to edge for accurate documentation. 🔆 Brightfield Optimized — Designed for standard brightfield reflected light microscopy. 🔬 Multi-Modal Capability — Compatible with DIC, fluorescence, and polarization techniques. 🔧 Product Description The Olympus MPLFLN 100× Objective is a premium semi-apochromatic lens engineered for maximum magnification industrial microscopy. With an exceptional 0.90 numerical aperture at 100× magnification, this objective delivers the highest resolution available for observing ultra-fine details in microstructures, defects, and surface features that are invisible at lower magnifications. The ultra-high 0.90 numerical aperture provides exceptional resolution and light-gathering capability, revealing the finest details in grain boundaries, microstructures, surface defects, and material features with unparalleled clarity. At 100× magnification, this objective enables observation of submicron features critical for semiconductor failure analysis, advanced metallography, and precision materials characterization. The MPLFLN series is specifically designed for material inspection and offers excellent performance across multiple observation methods. Beyond brightfield, this objective is compatible with differential interference contrast (DIC), fluorescence, and simple polarized light techniques. This multi-modal capability enables comprehensive sample characterization at maximum magnification using a single objective. The semi-apochromatic optical design delivers superior color correction across the visible spectrum, ensuring accurate color rendition, high contrast, and sharp imaging essential for photomicrography, digital documentation, and quantitative image analysis at high magnification. The plan fluorite construction provides flat-field imaging with minimal curvature of field, maintaining sharp focus from the center to the edge of the field of view. With a working distance of 1.0 mm, this objective is optimized for ultra-high numerical aperture performance with polished metallographic specimens, semiconductor wafers, and other flat samples commonly encountered in industrial microscopy. The short working distance is typical for high-NA objectives at this magnification and enables the maximum resolution possible. At 100× magnification, this objective provides the highest power for detailed structure observation, revealing submicron features and ultra-fine details critical for failure analysis, defect characterization, and advanced materials research. The combination of ultra-high numerical aperture and semi-apochromatic correction makes this objective essential for applications requiring the absolute highest resolution and image quality. Designed for reflected light industrial microscopy, this objective features a standard RMS thread mount and is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments where maximum magnification and the highest image quality are essential. 🔎 Typical Applications Maximum magnification metallography and microstructure analysis Semiconductor wafer inspection and failure analysis Submicron defect detection and characterization Differential interference contrast (DIC) imaging Materials science and grain boundary analysis Advanced research and precision quality control 📊 Key Specifications Specification Details Magnification 100× Numerical Aperture (NA) 0.90 (Ultra-High) Working Distance 1.0 mm Contrast Methods Brightfield Optical Design MPLFLN (M Plan Fluorite) Field Flatness Plan (Flat-field) Color Correction Semi-Apochromatic Additional Compatibility DIC, Fluorescence, Polarization Thread Mount RMS (20.32 x 36 TPI) Application Industrial Reflected Light Microscopy Compatibility Olympus BX, GX, MX, BHM series microscopes Catalog Number 1-U2M534 Country of Origin Japan SKU N2181900 Condition New 💼 University Purchase Orders Accepted Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.
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