Premium 20× semi-apochromatic objective with high numerical aperture — ideal for high-resolution industrial microscopy and detailed materials analysis. 🔬 20× Magnification, NA 0.46 — High numerical aperture delivers superior resolution and light-gathering capability. ✨ Semi-Apochromatic Correction — Excellent color correction and image quality across the visible spectrum. 🎯 Plan Fluorite (UMPLANFL) Optics — Flat-field imaging from center to edge for accurate documentation. 🔆 Brightfield Optimized — Designed for standard brightfield reflected light microscopy. ⚖️ Balanced Performance — Optimal combination of resolution, working distance, and field of view. 🔧 Product Description The Olympus UMPLANFL 20× Objective is a versatile semi-apochromatic lens engineered for high-resolution industrial microscopy applications. With a high numerical aperture of 0.46 and 20× magnification, this objective delivers exceptional resolution and detail for demanding materials analysis, metallography, semiconductor inspection, and quality control workflows. The UMPLANFL series represents Olympus's universal M plan fluorite design, offering well-balanced performance across multiple parameters. The high 0.46 numerical aperture provides superior light-gathering capability and resolution compared to lower NA objectives, revealing fine details in microstructures, grain boundaries, defects, and surface features that are critical for materials characterization and failure analysis. At 20× magnification, this objective strikes an ideal balance between detail and field of view. It provides sufficient magnification to resolve fine features while maintaining a field of view large enough for efficient sample navigation and contextual observation. This makes it a workhorse objective for industrial microscopy, suitable for the widest range of applications from initial sample survey to detailed feature examination. The semi-apochromatic optical design delivers excellent color correction across the visible spectrum, significantly superior to achromatic objectives. This ensures accurate color rendition, high contrast, and sharp imaging essential for photomicrography, digital documentation, and quantitative image analysis. The plan fluorite construction provides flat-field imaging with minimal curvature of field, maintaining sharp focus from the center to the edge of the field of view. With a working distance of 3.1 mm, this objective provides adequate clearance for most standard samples while maintaining the high numerical aperture necessary for superior resolution. This working distance is well-suited for polished metallographic specimens, semiconductor wafers, and other flat or near-flat samples commonly encountered in industrial microscopy. Designed for reflected light brightfield microscopy, this objective is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems via standard RMS thread mount. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments where consistent, high-quality imaging is essential. 🔎 Typical Applications Metallography and microstructure analysis Semiconductor wafer and IC inspection Materials science and grain boundary analysis Quality control and failure analysis Precision optics and surface characterization Industrial research and development 📊 Key Specifications Specification Details Magnification 20× Numerical Aperture (NA) 0.46 Working Distance 3.1 mm Contrast Methods Brightfield Optical Design UMPLANFL (Universal M Plan Fluorite) Field Flatness Plan (Flat-field) Color Correction Semi-Apochromatic Thread Mount RMS (20.32 x 36 TPI) Application Industrial Reflected Light Microscopy Compatibility Olympus BX, GX, MX, BHM series microscopes SKU 1-UM525 Condition Excellent (Flawless Optics) 💼 University Purchase Orders Accepted Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.
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