EQ-PCE-66 is a compact Ultraviolet (UV) Ozone cleaner, which is a dedicated system to remove a variety of contaminants from the surfaces of substrates samples. UV Ozone cleaning is simple to use in the dry process which is a highly effective method to clean surfaces. The cleaning effect is caused by irradiating the surface of a substrate with suitable lamps creating enough energy in the UltraViolet spectrum range. It is the photo-sensitized oxidation process by atomized Oxygen and highly reactive Ozone. The UV radiation directly to the surface stimulates the reaction. Volatile hydrocarbon products are produced. The removal of hydrocarbons in nanometer thickness by oxidation results in ultra-clean surfaces with significant wettability. This is very important before the thin-film coating process of glass and ceramic surfaces. SPECIFICATIONS Input Power AC 220V±10%, 50/60Hz AC110V is available by a 200W 110V-220C transformer ( click underlined to order ) Features To remove a variety of contaminants from the surfaces of substrate samples Use the dry process to clean surfaces with the highly effective method Generate energy at wave line between 254nm to 185nm There is an Oxygen inlet port and ozone removal pump LCD unit with substrate temperature display. Buzzer for indicating completion of cleaning Locking feature for locking the sample feeding tray to avoid opening during operation UV Lamp UV lamp power: 120W Max. Wavelength: 254 nm and 185 nm Max substrate size: 150 x 150 mm ( 6"x 6") Chamber & Sample Stage Tray size: 176mm x 168mm Sample feeding: slide-based LCD Display Time Duration: 1 - 99 sec/min/hr Sample Temperature measurement feature (no heating function, only a thermocouple installed) Exhausting Fan An exhausting duct with a fan is installed on the back of the O-Zone cleaner. Easy to connect with an air pipe for exhausting the O-zone gas generated by the cleaner to the outside of the building. Product Dimension Please click the pic for more detail. Shipping Weight & Dimensions 70 lbs 40"x30"x22" Application Cleaning molecular contamination from SPTs, AFM tips, and surfaces Curing UV-adhesives UV-photopatterning of SAM surfaces Oxidizing PDMS Surface sterilization Etch, pattern, sharpen Clean MEMS devices Clean substrate surfaces such as Si, Ge, GaAs, and all oxide crystal substrates Consumable Parts Replacement lamps Reference articles C. Koenigsmann et al. J. Am. Chem. Soc. 2011, 133, 25, 9783–9795. M. Cargnello, J. Am. Chem. Soc. 2015, 137, 21, 6906–6911. D. Li, ACS Catal. 2012, 2, 7, 1358–1362.
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