8" Poromeric Polishing Pad (PSA) for Final Polishing - PP8PSA

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Poromeric pad is made of napped none-woven materials with uniform pore structure and wall strength. The standard sizes of poromeric polishing pads are 8", 10" ,12" and 15". Specifi cation Size 8" Thickness 1.65mm Tear Strength Machine Direction: 57N Transverse Direction: 56N Elongation Machine Direction: 53% Transverse Direction: 86% Tensile Strength Machine Direction: 642 N/3cm (force applied within a 3 cm range) Transverse Direction: 511 N/3cm (force applied within a 3 cm range) Application Final polishing of LiNbO3 and Sapphire wafers Final polishing in CMP for semiconductors and oxide crystals. EPI polishing for all single crystal substrates. Show more