Shadow masks are precision-fabricated physical masks used for patterned thin-film deposition without photolithography. They are widely applied in thermal evaporation, e-beam evaporation, sputtering, and atomic layer deposition (ALD) processes, enabling direct material deposition through predefined openings onto substrates. Unlike optical photomasks, shadow masks are placed in close proximity or direct contact with the substrate, allowing fast, resist-free pattern transfer. This makes them especially valuable for rapid prototyping, materials research, lift-off–free processing, and substrates incompatible with photoresists, such as flexible, temperature-sensitive, or chemically reactive materials. We provide custom shadow masks manufactured from a variety of materials including stainless steel, nickel, molybdenum, tungsten, silicon, and quartz, selected based on deposition temperature, chemical compatibility, and feature size requirements. Advanced fabrication techniques such as laser cutting, chemical etching, and microfabrication are used to achieve precise apertures and tight tolerances. Our shadow masks support custom geometries, fine feature sizes, and high positional accuracy, suitable for applications ranging from electrode patterning and device fabrication to research-scale thin-film experiments. Single-use and reusable designs are available to meet different throughput and contamination-control needs. Feel free to send your design (even a hand-drawn sketch) to us ([email protected]). Our engineers will help you realize your custom shadow mask. Key Features & Capabilities Resist-free patterning for thin-film deposition Compatible with evaporation, sputtering, and ALD Custom materials and thickness options Fine feature sizes and tight tolerances Rapid turnaround for prototyping and R&D Reusable or single-use designs available Typical Applications Thin-film electrode patterning Semiconductor and MEMS device fabrication Organic electronics (OLED, OPV) Sensors and microelectronic devices Research and rapid prototyping Lift-off–free deposition processes Key Specifications: Thickness Range: 0.01mm to 5mm Tolerance: ±0.002mm for exceptional accuracy Feature Resolution: Minimum width of features as small as 0.02mm Frequently Asked Questions — Shadow Masks What is a shadow mask? A shadow mask is a physical mask used for patterned thin-film deposition without photolithography. Material is deposited through predefined openings in the mask directly onto the substrate during evaporation, sputtering, or ALD processes. How is a shadow mask different from a photomask? Unlike photomasks used with photoresist and lithography, shadow masks enable resist-free, direct patterning. They are placed in close proximity or contact with the substrate and are ideal for rapid prototyping, lift-off–free processes, and substrates incompatible with photoresists. What deposition methods are compatible with shadow masks? Shadow masks are compatible with thermal evaporation, e-beam evaporation, sputtering, and atomic layer deposition (ALD). Mask material selection depends on process temperature and chemical environment. What materials are available for shadow masks? Shadow masks can be fabricated from stainless steel, nickel, molybdenum, tungsten, silicon, or quartz. The material is selected based on deposition temperature, mechanical stability, feature size, and chemical compatibility. What is the minimum feature size you can achieve? Depending on material and fabrication method, minimum feature sizes down to ~20 µm are achievable, with tight dimensional tolerances suitable for research and device fabrication. Are shadow masks reusable? Yes. Both reusable and single-use shadow masks are available. Reusable masks are typically used for repeated depositions, while single-use masks help minimize cross-contamination in sensitive processes. Can shadow masks be customized? Absolutely. We provide fully custom designs, including mask geometry, thickness, aperture layout, alignment features, and material selection based on your deposition system and application. Are shadow masks suitable for research and production? Yes. Shadow masks are widely used in university research, rapid prototyping, pilot-scale fabrication, and small-batch production, especially where fast turnaround and process flexibility are required. .product-faq { margin-top: 48px; } .product-faq h2 { font-size: 1.4rem; margin-bottom: 22px; } .product-faq details { border: 1px solid #e5e5e5; border-radius: 8px; margin-bottom: 12px; padding: 14px 18px; background: #fafafa; } .product-faq details[open] { background: #ffffff; } .product-faq summary { font-weight: 600; cursor: pointer; list-style: none; position: relative; padding-right: 28px; } .product-faq summary::after { content: "+"; position: absolute; right: 0; top: 0; font-size: 18px; } .product-faq details[open] summary::after { content: "–"; } .product-faq summary::-webkit-details-marker { display: none; } .product-faq .faq-content { margin-top: 12px; color: #555; line-height: 1.65; }
