Spin Module SM-300

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Spin Module SM-300 ‎ Optimal choice for semi-automatic coatings The Spin Module SM-300 is the optimal choice for semi-automatic coating of thin layers. All commercial photoresists and coating materials can be coated homogeneously on wafers up to 300 mm (12 inches) or 200 x 200 mm (8 × 8 inches) substrates. The Round-Closed Chamber Technology (RCCT) system effectively reduces air turbulence over the rotating substrate and improves coating uniformity by saturating the atmosphere with solvents faster in the closed chamber. This results in slower drying of the photoresist and a more homogeneous coating process with remarkable savings in consumed media. The high-precision instruments are available both as mobile cabinet and bench-mounted units. Show more