Copper (Cu) Sputtering Target, 99.995%-99.9999% Purity

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About this item Customizable Options: specifications, shapes, sizes, purity, and bonding methods available High Performance: high purity, high density, and uniform grain for superi or film quality Wide Material Range: metals, nonmetals, alloys, and ceramics to meet diverse needs Experimental Use: ideal for thin film deposition in semiconductors, display panels, solar cells, and other fields, delivering high-performance coatings through sputtering Show more