Thermo Scientific Cobalt Sputtering Target

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Cobalt Sputtering Target, 50.8 mm High-purity cobalt sputtering target designed for use in thin-film deposition processes, including magnetron sputtering, to produce cobalt coating s for various industrial and research applications. Product Details: Chemical Formula: Co Molecular Weight: 58.93 g/mol CAS Number: 7440-48-4 Purity: 99.95% (metals basis) Physical Form: Solid, odorless SMILES Representation: [Co] Safety Information: Hazard Statements: May cause an allergic skin reaction (H317). May cause allergy or asthma symptoms or breathing difficulties if inhaled (H334). May cause cancer (H350). Uses Thin Film Deposition: Used in semiconductor manufacturing, magnetic storage devices, and optical coatings. Electroplating: Provides hardness, oxidation resistance, and an attractive appearance. Magnetic Applications: Essential for spintronics, MRAM, and high-frequency inductive components. Research & Development: Utilized in material science experiments and nanotechnology. Features High Purity: Ensures consistent film quality and low contamination. Excellent Magnetic Properties: Ideal for magnetic thin films and sensor applications. Uniform Thickness: Provides stable deposition rates. Customizable: Available in different thicknesses and bonding options Show more