Zeiss EC Epiplan-Neofluar 100X BD DIC Microscope Objective for Reflected Light Microscopy 🔬 Premium EC Epiplan-Neofluar objective for reflected light microscopy 🎯 100X magnification with 0.90 numerical aperture for exceptional resolution 🌈 Neofluar optics deliver superior chromatic correction and high contrast 🔆 Multi-contrast capability: Brightfield, Darkfield, and DIC compatible 📏 0.28mm working distance suitable for standard specimen preparations 🔧 M27 thread compatible with Zeiss Axio series microscope systems ✨ Excellent condition with flawless optics 🔧 Product Description The Zeiss EC Epiplan-Neofluar 100X BD DIC is a premium multi-contrast objective engineered specifically for reflected light (epi-illumination) microscopy applications requiring multiple observation techniques and superior optical quality at high magnification. As part of Zeiss's EC (Extended Contrast) Epiplan-Neofluar series, this objective combines advanced Neofluar optical design with multi-contrast capability, delivering superior chromatic correction, high contrast, and excellent flatness of field for industrial inspection, materials science, and metallurgical applications. The Neofluar optical formula provides enhanced color correction compared to standard objectives, ensuring accurate color reproduction and improved image quality when examining metal surfaces, semiconductors, and other reflective specimens. The "BD DIC" designation indicates compatibility with Brightfield, Darkfield, and Differential Interference Contrast (DIC) imaging modes, making this objective exceptionally versatile for revealing different types of surface features, defects, and microstructural details. With a high 100X magnification and exceptional 0.90 numerical aperture, this objective provides outstanding resolution for detailed examination of fine surface features, while the 0.28mm working distance accommodates standard specimens. The M27 thread ensures compatibility with modern Zeiss Axio series microscopes, and the infinity-corrected optical design allows for the insertion of DIC prisms and other optical accessories. This objective is in excellent condition with flawless optics, offering professional-grade multi-contrast performance at high magnification. 🔎 Typical Applications Metallurgical analysis and materials science with multiple contrast modes Semiconductor wafer inspection and defect characterization Industrial quality control and surface inspection Failure analysis requiring brightfield, darkfield, and DIC imaging Microstructural analysis and grain boundary examination Printed circuit board (PCB) inspection with enhanced contrast Fine surface feature analysis at high magnification Multi-contrast reflected light microscopy for comprehensive analysis 📊 Key Specifications Specification Details Model / Catalog Number Zeiss EC Epiplan-Neofluar 100X BD DIC / 422392 Magnification 100X Numerical Aperture (NA) 0.90 Optical Design EC Epiplan-Neofluar, Infinity-Corrected Illumination Type Reflected light (epi-illumination) Contrast Modes Brightfield, Darkfield, DIC (Differential Interference Contrast) Working Distance 0.28mm Thread Type M27 (27mm metric thread) Compatibility Zeiss Axio series reflected light microscopes Optical Correction Neofluar (enhanced chromatic correction) Recommended Applications Metallurgy, materials science, semiconductor inspection, multi-contrast imaging Condition Excellent, flawless optics University purchase orders are welcome and accepted. Please contact us for institutional pricing and procurement assistance.
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