Zeiss LD Epiplan 20X Long Working Distance Microscope Objective for Reflected Light Microscopy π¬ High-performance LD Epiplan objective for reflected light microscopy π― 20X magnification with 0.40 numerical aperture for versatile imaging π Long working distance for thick specimens and manipulation π§ RMS thread compatible with Zeiss infinity-corrected microscope systems β¨ Excellent condition π§ Product Description The Zeiss LD Epiplan 20X is a versatile long working distance objective engineered specifically for reflected light (epi-illumination) microscopy applications requiring extended working distance at mid-magnification. As part of Zeiss's LD (Long Distance) Epiplan series, this objective combines 20X magnification with extended working distance, providing excellent clearance for thick specimens, wafers, and samples requiring manipulation or measurement. With a numerical aperture of 0.40, this objective delivers good resolution and light-gathering capability for detailed examination of metal surfaces, semiconductors, and other reflective specimens. The infinity-corrected optical design ensures compatibility with modern Zeiss microscope systems and allows for the insertion of optical accessories such as polarizers and beam splitters without compromising image quality. Featuring standard RMS threading, this objective integrates seamlessly with Zeiss Axio and other infinity-corrected reflected light microscopes. This objective is in excellent condition, offering professional-grade performance for laboratories and quality control facilities conducting metallurgical analysis, semiconductor inspection, and materials characterization at mid-magnification. π Typical Applications Metallurgical analysis and materials science Semiconductor wafer inspection Industrial quality control and surface inspection Failure analysis and forensic examination Microstructural analysis Printed circuit board (PCB) inspection Thick specimen imaging Brightfield reflected light microscopy π Key Specifications Specification Details Model / Catalog Number Zeiss LD Epiplan 20X / 442840 Magnification 20X Numerical Aperture (NA) 0.40 Optical Design LD Epiplan, Infinity-Corrected Illumination Type Reflected light (epi-illumination) Contrast Modes Brightfield Working Distance Long working distance Thread Type RMS (Royal Microscopical Society) standard Compatibility Zeiss infinity-corrected reflected light microscopes Recommended Applications Metallurgy, materials science, semiconductor inspection Condition Excellent University purchase orders are welcome and accepted. Please contact us for institutional pricing and procurement assistance.