Zeiss LD Epiplan 50X HD DIC Long Working Distance Microscope Objective for Reflected Light Microscopy 🔬 High-performance LD Epiplan objective for reflected light microscopy 🎯 50X magnification with 0.50 numerical aperture for detailed imaging 🔆 Multi-contrast capability: Brightfield, Darkfield (HD), and DIC compatible 📏 Extra-long 6.5mm working distance ideal for thick specimens and manipulation 🔧 M27 thread compatible with Zeiss Axio series microscope systems ✨ Excellent condition with flawless optics 🔧 Product Description The Zeiss LD Epiplan 50X HD DIC is a versatile long working distance objective engineered specifically for reflected light (epi-illumination) microscopy applications requiring multiple observation techniques and extended working distance. As part of Zeiss's LD (Long Distance) Epiplan series, this objective combines high-magnification imaging with an exceptionally long 6.5mm working distance, making it ideal for examining thick specimens, wafers, and samples requiring manipulation or measurement. The "HD DIC" designation indicates compatibility with Brightfield, Darkfield (HD - High Definition), and Differential Interference Contrast (DIC) imaging modes, making this objective exceptionally versatile for revealing different types of surface features, defects, and microstructural details. With a 50X magnification and 0.50 numerical aperture, this objective provides excellent resolution for detailed examination of metal surfaces, semiconductors, and other reflective specimens, while the long working distance provides ample clearance for DIC prisms, polarizers, and other optical accessories. The infinity-corrected optical design ensures compatibility with modern Zeiss Axio microscope systems and allows for the insertion of optical components without compromising image quality. This objective is in excellent condition with flawless optics, offering professional-grade multi-contrast performance for laboratories and quality control facilities using Zeiss Axio reflected light microscopes. 🔎 Typical Applications Metallurgical analysis and materials science with multiple contrast modes Semiconductor wafer inspection and defect characterization Industrial quality control and surface inspection Failure analysis requiring brightfield, darkfield, and DIC imaging Microstructural analysis and grain boundary examination Printed circuit board (PCB) inspection with enhanced contrast Thick specimen imaging requiring long working distance Multi-contrast reflected light microscopy for comprehensive analysis 📊 Key Specifications Specification Details Model / Catalog Number Zeiss LD Epiplan 50X HD DIC / 442855 Magnification 50X Numerical Aperture (NA) 0.50 Optical Design LD Epiplan, Infinity-Corrected Illumination Type Reflected light (epi-illumination) Contrast Modes Brightfield, Darkfield (HD), DIC (Differential Interference Contrast) Working Distance 6.5mm (long working distance) Thread Type M27 (27mm metric thread) Compatibility Zeiss Axio series reflected light microscopes Recommended Applications Metallurgy, materials science, semiconductor inspection, multi-contrast imaging Condition Excellent, flawless optics University purchase orders are welcome and accepted. Please contact us for institutional pricing and procurement assistance.
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