88150&88180High Resolution Sputter Coater 208HRD withthickness controller MTM-20 The main features are: Wide Choice of Coating Materials: Magnetron head design and effective gas handling allow a wide choice of target materials. Precision Thickness Control: Thickness optimized using the MTM-20 high resolution thickness controller. Multiple Sample Stage Movements: Separate rotary, planetary and tilting movements allow optimized coating distribution and coverage. (view RPT Stage) Variable Chamber Geometry: Chamber geometry can be adjusted for coarse control of deposition rates. Wide Range of Operating Pressures: Independent power/pressure adjustment allows operation at argon gas pressure ranges of 0.2 - 0.005 mbar. Compact Modern Benchtop Design: Space and energy saving design eliminates need for floor space and specialized electrical connections. R-P-T Stage with crystal head 208HRD-150 (model 88150) Turbo Sputter Coater for FE-SEM specific features: Fixed magnetron sputter head with shutter Ø150 chamber with height adjustment Ø150 R-P-T stage with 4 planetary motion tables Plasma voltage monitor MTM-20 thickness control system Electrically switched precision gas leak Compound TMP ISO63 with cooling fan Diaphragm backing pump 1.2/1.4 m3/hr A Second Chamber Outfit for 208HRD-150 (87050) can be ordered separately if R-T or R-P-T stages are not necessary for specific applications. This part number includes:1. Glass Chamber (∅150 x 150mm) 2. Metal Spacer (∅150 x 15mm) 3. Static Sample Table with height adjuster NOTES: 1. Uses Ø28 sputter target with thickness 0.2 – 3.2. Target spacers are included. TARGET IS NOT INCLUDED 2. 4 x planetary tables are included. Pin stub tables are standard unless alternative tables are specified (see below) 3. Dry pump is standard unless alternative oil-filled rotary pump (2.5 m3/hr) is specified 208HRD-180 (model 88180) Turbo Sputter Coater for Thin Film R&D specific features: Sliding/tilting magnetron sputter head with shutter Ø180 Chamber with height adjustment Ø180 R-T (rotary/tilting) stage with substrate table Plasma voltage monitor Penning high vacuum gauge MTM-10 thickness monitor system Electrically switched precision gas leak Compound TMP ISO63 with cooling fan Diaphragm backing pump 1.2/1.4 m3/hr NOTES: 1. Uses Ø28 sputter target with thickness 0.2 – 3.2. Target spacers are included. TARGET IS NOT INCLUDED 2. ∅80mm table substrate table is included 3. Dry pump is standard unless alternative oil-filled rotary pump (2.5 m3/hr) is specified SPECIFICATION High resolution sputter coater Chamber size 150mm Ø or 180mm Ø with variable height Sputter head Planar magnetronShutter for target conditioningWrap-around dark-space shield Sputter target 28mm Ø, various materials Sputter supply Microprocessor basedSafety interlockedCurrent control independent of vacuumDigitally selectable current (20, 40, 60 or 80mA) Sample stage Non-repetitive rotary planetary motion with manual tiltVariable speed rotationCrystal head4 sample holders Analogue metering Vacuum, Atm - 0.001mbCurrent, 0 - 100mA Control method Automatic process sequencingFull manual overrideAutomatic vent Thickness monitoring Optional, MTM-10 only Thickness control MTM-20 with termination facility Dimensions Width 600mm (23.6"), Depth 600mm (23.6"),Height 450mm (17.7") Weight 40kg (88.5 lbs) Power 45 VA max (excluding rotary pump) Pumping system Configuration Turbo-drag/diaphragm pump pump combination Pumpdown time Approx. 10 min. to 4 x 10-5 mb Ultimate pressure Approx. 8 x 10-6 mb Desktop system Backing pump is mounted on desktop compatible anti-vibration tableAll metal vacuum coupling system Services required Supply 100 - 120 or 200 - 240 VAC, 50/60Hz(specify on order) Power 550 VA max Argon gas Purity, min. 99.9%Pressure, regulated 7 - 8 psi (0.5 - 0.6 bar)Hose connection, 6.0mm (¼") Coating Difficult Samples for FE-SEM The Cressington 208HRD now offers real solutions to the problems encountered when coating difficult samples for FE-SEM. In order to minimize the effects of grain size the 208HRD offers a full range of coating materials and gives unprecedented control over thickness and deposition conditions. To minimize charging effects the 208HRD stage design and wide range of operating pressures allows precise control of the uniformity and conformity of the coating.
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