Sapphire wafers and substrates are high-quality single crystal materials composed of aluminum oxide (Al₂O₃), widely used in semiconductor epitaxy, LED manufacturing, RF devices, power electronics, and optical applications. Sapphire combines exceptional mechanical strength, thermal stability, chemical inertness, and excellent optical transparency, making it one of the most versatile substrate materials in advanced technology fields. With a wide optical transmission range from the ultraviolet to mid-infrared, sapphire substrates are well suited for optoelectronic and photonic devices. At the same time, their high melting point and thermal conductivity enable stable operation during high-temperature epitaxial growth processes such as MOCVD, MBE, and HVPE. Sapphire wafers are most commonly used as substrates for GaN-based epitaxy, supporting the fabrication of LEDs, laser diodes, RF amplifiers, and power devices. Multiple crystallographic orientations are available to optimize lattice matching, surface morphology, and device performance for specific material systems. Our sapphire substrates are manufactured with strict control of crystal orientation, surface flatness, thickness uniformity, and defect density. Precision polishing ensures low surface roughness suitable for epitaxial growth and microfabrication, supporting both research-scale development and commercial production. Key Features & Properties Material: Single crystal sapphire (Al₂O₃) Excellent mechanical strength and hardness High thermal stability and high melting point Wide optical transmission range (UV–IR) Chemically inert and corrosion resistant Low surface roughness and high flatness Compatible with high-temperature epitaxy Typical Applications GaN-based LED and laser diode substrates RF and microwave devices Power electronics and high-temperature devices Semiconductor epitaxial growth Optical windows and substrates Sensors and MEMS devices Custom wafer sizes, thicknesses, orientations, and surface finishes are available upon request. Properties: Material: High Purity >99.99%, single crystal Al2O3 Thickness: 430 um +/- 25 um for SSP and 400 um +/- 15 um for DSP (other thickness available upon request) Orientation: C plane (0001) to M (1-100) 0.2 +/- 0.1 degree off. Polishing: single side polished polished side surface Ra < 0.3 nm, back side fine-ground Ra = 0.8 ~ 1.2 um, or double side polished both front and back sides surface Ra < 0.3 nm Minimum Order Quantity (MOQ): 10 pieces per order Frequently Asked Questions — Sapphire Wafers & Substrates What are sapphire wafers used for? Sapphire wafers are widely used as single-crystal substrates for semiconductor epitaxy, especially for GaN-based LEDs, laser diodes, RF devices, and power electronics. They are also used in optical windows, sensors, and MEMS devices due to their excellent mechanical and thermal properties. Why is sapphire commonly used for GaN epitaxy? Sapphire offers high thermal stability, chemical inertness, and compatibility with high-temperature epitaxial processes such as MOCVD, MBE, and HVPE. Its availability in multiple crystal orientations makes it suitable for GaN-based device fabrication. What crystal orientations are available? Common sapphire orientations include C-plane (0001), A-plane (11-20), R-plane (1-102), and M-plane (1-100). Off-cut angles can be customized to optimize surface morphology and epitaxial growth quality. What surface finish options are offered? Sapphire wafers can be supplied as single-side polished (SSP) or double-side polished (DSP). Optical-grade polishing achieves surface roughness below Ra < 0.3 nm, suitable for epitaxial growth and microfabrication. Are sapphire wafers compatible with high-temperature processing? Yes. Sapphire has a very high melting point and excellent thermal stability, making it fully compatible with high-temperature semiconductor processing and epitaxial growth environments. What wafer sizes and thicknesses are available? Standard and custom wafer sizes and thicknesses are available. Thickness, diameter, edge profile, and flatness can be tailored to meet specific research or production requirements. Are sapphire substrates suitable for both research and mass production? Absolutely. Our sapphire wafers are supplied to universities, research institutes, and commercial semiconductor manufacturers, supporting both R&D-scale development and large-volume production. Can you provide custom specifications? Yes. Custom orientations, off-cut angles, surface finishes, wafer sizes, and thicknesses are available upon request. 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